Yahoo Search Búsqueda en la Web

Resultado de búsqueda

  1. 13 de may. de 2024 · The electronic structure measured by EELS spectra shows differences between the domain and wall and provides evidence for the wall conductivity. The domains possess a larger structural distortion owing to the monoclinic scheelite structure compared to the tetragonal scheelite wall.

  2. Hace 3 días · Figure 2. Infrared face-to-face dimer plasmons. We compare EELS measurements and calculations for e-beams aimed at different locations around face-to-face touching and nontouching dimers (∼10 nm gap) formed by F-IO nanocubes of 200 nm side length. (a–c) Measured EELS spectra at the three e-beam positions indicated by the red dots in the insets.

  3. 4 de may. de 2024 · Electron energy-loss spectroscopy (EELS) and cathodoluminescence (CL) represent two primary electron microscopy techniques capable of probing the optical properties of materials and devices at spatial resolutions below the diffraction limit of light [ 1–3 ].

  4. 20 de may. de 2024 · The optical absorption spectra indicate that the H hydrogenation significantly influences the reduction of the band gap from 3.0 to 2.9 eV. The J-V curves demonstrate that samples treated at a wire temperature of 1700°C exhibit the highest PEC activity, reaching 2.5 mA cm −2 at 1.23 V vs. RHE.

  5. 6 de may. de 2024 · Simulated phonon electron energy-loss spectroscopy (EELS) for Si [110] at T = 300 K. (a) EELS spectra scaled to fractional inelastic scattering intensity for 500 Å thickness at two probe positions marked by crosses in the inset.

  6. 9 de may. de 2024 · Atomic-scale scanning transmission electron microscopy (STEM) imaging and electron energy loss spectroscopy (EELS) experiments were performed on a Nion UltraSTEM operated at 200 kV and equipped with a Gatan Enfinium EELS spectrometer. The spectra were acquired and processed using Gatan Digital Micrograph with a dispersion of 0.25 eV ...

  7. 24 de may. de 2024 · We note that EELS spectra from the near-surface region were found to show a significant V 3+ component, which is ascribed to damage caused during the sample preparation. Before the experiment, the surface of the samples was cleaned by a plasma treatment using a 1020 Fischione Ar–O plasma cleaner.